About
In advanced electronic device fabrication, it is crucial to control the material structure at the atomic and molecular level. Additionally, high-precision evaluations are required for device observation and material analysis using techniques such as electron microscopy. Fabrication and analysis of such advanced devices are carried out using quantum beams, such as electron beams or extreme ultraviolet rays. Therefore, knowledge of atomic and molecular behavior under quantum beam irradiation is necessary.
To support nano-scale fabrication and analysis, we have developed our own simulation methods and are conducting research aimed at optimizing fabrication conditions and interpreting analysis results correctly.
