国際活動

-Oct.2019,Nara,Japan-

■Fabrication of Stoichiometry Controlled YbFe₂O₄ Epitaxial Thin Films Using PLD Method Controlled YbFe₂O₄ Epitaxial Thin Films Using PLD Method               J.Tanaka

■Domain Structure Imaging in P(VDF-TrFE) Films using Direct Piezoelectric Response Microscopy         I. Kanagawa

■Investigation of The Epitaxial Growth of PZT Thin Films on Si Substrates using TiN Buffer Layer          M. Murase

■Control of Epitaxial Orientation and Crystal Structure of HfO₂:Y/Si Films by Oxygen Partial Pressure    Y. Saho

■Growth of Highly-Resistive ZnO Films Fabricated using Non-Equilibrium Plasma Generated Near Atmospheric Pressure       S. Takarae

■Effects of bottom electrodes on the epitaxial growth of YbFe₂O₄ films       K. Shimamoto