Achievement

●General Thermal Texturization Process of MoS₂ for Efficient Electrocatalytic
Hydrogen Evolution Reaction
D.Kiriya,P.Lobaccaro, H. Y. Y. Nyein, P. Taheri, M. Hettick, H. Shiraki, C. M. Sutter-Fella,
P. Zhao, W. Gao, R. Maboudian, J. W. Ager, A. Javey
Nano Letters, 16, 4047-4053 (2016)
http://pubs.acs.org/doi/abs/10.1021/acs.nanolett.6b00569

●Superacid passivation of crystalline silicon surfaces
J.Bullock, D. Kiriya, N. Grant, A. A. Zacatzi, M. Hettick, T. Kho, P. Phang,
H. C. Sio, D. Yan, D. Macdonald, R. M. Wallace, A. Cuevas, A. Javey
ACS Applied Materials Interfaces, 8, 24205-24211 (2016)
http://pubs.acs.org/doi/abs/10.1021/acsami.6b07822

●High Luminescence Efficiency in MoS₂ Grown by Chemical Vapor Deposition
M.Amani, R. A. Burke, X. Ji, P. Zhao, D.-H. Lien, P. Taheri, G. H. Ahn,
D. Kiriya, J. W. Ager III, E.
ablonovitch, J. Kong, M. Dubey, A. Javey
ACS Nano. 10, 6535-6541 (2016)
http://pubs.acs.org/doi/abs/10.1021/acsnano.6b03443

●High efficiency piezoelectric MEMS vibration energy harvesters using
(100) oriented BiFeO₃ Films
M.Aramaki, K. Izumi, T. Yoshimura, S. Murakami, and N. Fujimura
Proc. of the 30th IEEE International Conference on Micro Electro Mechanical Systems, 829-832 (2016)

●Control of native acceptor density in epitaxial Cu2O thin films grown by electrochemical deposition
Atsushi Ashida, Shunsuke Sato, Takeshi Yoshimura, Norifumi Fujimura,
Journal of Crystal Growth, in press
https://doi.org/10.1016/j.jcrysgro.2016.11.023

●Ferroelectric properties of (Pb,La)(Zr,Ti)O₃ capacitors employing Al-doped ZnO top electrodes
prepared by pulsed laser deposition under different oxygen pressures
Y.Takada, N. Okamoto, T. Saito, K. Kondo, T. Yoshimura, N. Fujimura, K. Higuchi and A. Kitajima
Japanese Journal of Applied Physics, 55, 06JB04(2016)
https://www.researchgate.net/publication/303595631

●Al: ZnO Top Electrodes Deposited with Various Oxygen Pressures for Ferroelectric
(Pb, La)(Zr,Ti)O₃ Capacitors
Y.Takada, N. Okamoto, T. Saito, K. Kondo, T. Yoshimura, N. Fujimura, K. Higuchi and A. Kitajima
Electronics Letters, 52, 230−232 (2016)
https://www.researchgate.net/publication/287801699

●Fabrication of Doped Pb(Zr,Ti)O₃ Capacitors on Pt Substrates with Different Orientations
R.Tamano, T. Amano, Y. Takada, N. Okamoto, T. Saito, T. Yoshimura, N. Fujimura, K. Higuchi and A. Kitajima
Electronics Letters, 52 (16), 1399-1401 (2016)
https://www.researchgate.net/publication/303982232

●Evaluatioion of Deuterium ion Profile in (Pb,La)(Zr,Ti)O₃ Capacitors Structures with Conductive Oxide Top Electrode by Time of Flight Secondary Ion Mass Spectrometry
Y. Takada, R. Tamano, N. Okamoto, T. Saito, T. Yoshimura, N. Fujimura, K. Higuchi, A. Kitajima
and R. Shishido
Proc. 2016 IEEE ISAF/ECAPD/PFM, 1−4 (2016).

●Comparative Study of Ferroelectric (K,Na)NbO₃ Thin Films Pulsed Laser Deposition on Platinum Substrates with Different Orientation
R.Tamano, Y. Takada, N. Okamoto. T. Saito, K. Higuchi, A. Kitajima, T. Yoshimura, and N. Fujimura
Proc. 2016 IEEE ISAF/ECAPD/PFM, 1−4 (2016)
http://ieeexplore.ieee.org/document/7578063/

●Comparative Study of Hydrogen – and Deuterium – induced Degradation of Ferroelectric (Pb,La)(Zr,Ti)O₃ Capacitors Using Time of Flight Secondary Ion Measurement
Y.Takada, N. Okamoto, T. Saito, T. Yoshimura, N. Fujimura, K. Higuchi, A. Kitajima, and R. Shishido
IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 63, 1668-1673 (2016)
http://ieeexplore.ieee.org/document/7524024/

●Thickness dependence of piezoelectric properties of BiFeO₃ films fabricated using rf magnetron sputtering system
Masaaki Aramaki, Kento Kariya, Takeshi Yoshimura, Shuichi Murakami, and Norifumi Fujimura
Japanese Journal of Applied Physics 55, 10TA16 (2016)
http://doi.org/10.7567/JJAP.55.10TA16

●Effects of (Bi_1/2,Na_1/2)TiO₃ on the electrical properties of BiFeO₃-based thin films
Jin Hong Choi, Takeshi Yoshimura, and Norifumi Fujimura
Japanese Journal of Applied Physics 55, 10TA17 (2016)
http://doi.org/10.7567/JJAP.55.10TA17

●Direct measurements of electrocaloric effect in ferroelectrics using thin-film thermocouples
Yuji Matsushita, Atsushi Nochida, Takeshi Yoshimura, and Norifumi Fujimura
Japanese Journal of Applied Physics 55, 10TB04 (2016)
http://doi.org/10.7567/JJAP.55.10TB04